PROMETH2O - PROCESS METROLOGY FO TRACE WATER
On Monday 14 June 2021, from 9:30 to 16:30, the virtual kick-off meeting of the European project “PROMETH2O” will be held.
The project is coordinated by INRiM in collaboration with 19 European metrological, academic and industrial partners. It is devoted to the development of the metrology for trace water in ultra-pure process gases.
Such gases, which are used in semiconductor manufacturing processes, if contaminated by small quantities of water vapour (at part per billion level), may cause failure in microchip operation and significantly reducing the process yield of semiconductor manufacturing..
Researchers estimated that this contamination is responsible for more than 1 billion dollars loss at global scale and more than 100 million Euros in Europe.
The project will be devoted to the enhancement of measurement and control capabilities of the highly technological manufacturing processes that employ ultra-pure gases, from the production of microchip to flexible display optoelectronics. The project will help to fill the gap of knowledge about the metrological traceability for trace water at part per billion level