PROMETH2O - METROLOGY FOR TRACE WATER IN ULTRA-PURE PROCESS GASES
Water vapour is the single largest matrix contaminant in ultra-high purity (UHP) process gases used in semiconductor manufacturing processes.
Such gases, if contaminated by small quantities of water vapour (at part per billion level), may cause failure in microchip operation and significantly reducing the process yield of semiconductor manufacturing.
So, trace water measurement presents great challenges to both gas manufacturers and analytical instrument makers
Improve trace water measurement methods and techniques.
Fill the gap of knowledge about the metrological traceability for trace water at part per billion level by developing suitable primary standards.
Improve the present knowledge of thermophysical data of real humid gas mixtures.
Demonstrate improved trace water measurement methods in industrially-relevant facilities.
Facilitate the take up of the technology and measurement infrastructure developed in the project.