MetHPM

MetHPM- Metrology for Highly Parallel Manufacturing includes these objectives:

• Faster, more accurate surface structure measurement, for critical dimensions of tracks and channels and for production-speed quality control of micro-/nanostructures
• 1 µm substrate tracking for 10 µm overlay alignment
• Process optimisation, inline feedback exploiting defect-function correlation
• Traceability, standards and metrology guidance using your test cases